Poly-Wipes are constructed from monofilament polyester no-run knit, providing excellent strength, very good absorbency and chemical compatibility. These wipers are a perfect choice for general cleanroom and cleanroom equipment maintenance, semiconductor, aerospace and medical device assembly or critical applications were particulate contamination can be detrimental. 6259LEIPA and 6259LE7030 has the lowest particle counts due to laser sealed edges. The isopropyl alcohol is 100% semiconductor grade isopropyl alcohol filtered through 0.05 µm media. The water is deionized to >/= 18 MΩ and filtered through 0.2 microns filter.

FEATURES:

• Excellent solvent and acid resistance
• Monofilament “no-run” construction does not generate loose fibers
• Excellent durability for cleaning rough, abrasive, or irregular surfaces
• Extremely low ionic, NVR and particulate
• Good absorbency
• Cleanroom double bagged
• Resealable inner slider bag reduces solvent loss
• Eliminates solvent squirt bottles
• Ensures consistent level of wipe saturation
• Processed and packaged in a Class 10 cleanroom.

TYPICAL APPLLICATIONS:

Hi-Purity Alcohol Wipes 6259LE7030 can be used to clean:

• Semiconductor Wafer Fabs
• Aerospace Production Areas
• Medical Device Assembly
• General Cleanroom Cleaning
• Clean critical surfaces; metallic and non-metallic